172NM-쉶궗냼媛

  • NO SEMICONDUCTOR FAB
  • NO PHOTORESIST
  • NO DAMAGE ON SURFACE

172NM VUV CREATER INTRODUCTION

172NM

172NM 쎇뼱궃 洹좎씪룄 怨좎텧젰 172nm 吏곸궗媛곹삎 VUV 留덉씠겕濡 뵆씪利덈쭏 愿묒썝쓣 궗슜븯뿬, R&D 諛 젣議 깮궛 씪씤뿉 쟻슜 媛뒫븳, 룷넗젅吏뒪듃媛 遺덊븘슂븳 Photolithography Solution쓣 젣怨듯빀땲떎.

슦由щ뒗 cleanroom 怨듭젙 솚寃쎌씠 븘땶 씪諛섏뿰援ъ떎뿉꽌룄 PEDOT, PMMA, PET 벑怨 媛숈 떎뼇븳 쑀湲 臾쇱쭏쓽 理쒖냼 500nm 꽑룺쓽 Photolithography瑜 援ы쁽빀땲떎.

諛섎룄泥 怨듭젙 슫쁺 諛 쑀吏 蹂댁닔瑜 쐞븳 떆媛꾧낵 鍮꾩슜쓣 뾾븷怨, 怨좉컼씠 뿰援ш컻諛쒓낵 봽濡쒖젥듃뿉留 吏묒쨷븷 닔 엳룄濡 빀땲떎.

꽌鍮꾩뒪

172NM 꽌鍮꾩뒪遺꾩빞

  • 룷넗由ъ냼洹몃옒뵾

    92%

  • 留덉씠겕濡 뙣꽣떇

    85%

  • 留덉씠겕濡쒗뵆猷⑥씠뵓뒪

    82%

  • 쑀湲곕Ъ 愿묒뼱釉붾젅씠뀡

    68%

  • 몴硫댁꽭젙

    96%

  • 뙆슫뱶由

    93%

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