172nm-ja-鴉싩ㅎ榮밥퍔

172NM VUV CREATER INTRODUCTION

172NM

172NM겘꽛굦걼쓦嶺됧벧겏遙섇눣뒟172nm빓뼶壤줧UV깯궎궚꺆깤꺀궨깯뀎繹먦굮鵝욜뵪걮겍갧&D룋겞獒썽좂뵟뵣꺀궎꺍겓겑뵪룾꺗겒곥깢궔깉꺃궦궧깉걣訝띹쫨겒Photolithography Solution굮룓堊쎼걮겲걲

燁곥걼걾겘Cleanroom藥η쮮뮥罌껁겎겒걚訝닾젘令뜹ㅳ겎굚PEDOT갥MMA갥ET겒겑겗굠걝겒걬겲걭겲겒쐣艅잏돥蘊ゃ겗弱500nm亮끹겗Photolithography굮若잏뤎걮겲걲

뜇弱롣퐪藥η쮮겗걢뼳걡굠겞깳꺍깇깏꺍궧겗걼굙겗셽뼋겏縕사뵪굮겒걦걮,걡若€쭣겗젘令띌뼀쇇겏깤꺆궦궒궚깉겓겗겳썓訝겎걤겲걲

겲걼곲쳵듅럤FLAT SURFACE EXCIMER곲쳵듅럤172nm VUV겗겑뵪굮싥걯걼쐣艅잏돥겗烏③씊릫궥걣겒걚烏③씊域쀦탡곮〃씊눇릤㎬꺗굮룓堊쎼걮겲걲

璵떃늽뇦

172NM 璵떃늽뇦

  • 겑뵪늽뇦

    92%

  • PHOTORESIST 걣恙낁쫨겒걚PHOTOLITHOGRAPHY

    85%

  • 깯궎궚꺆깢꺂궎깈궍긿궚궧&깘궎궕긽긿깤

    82%

  • 쐣艅잏돥뀎궋깣꺃꺖궥깾꺍

    68%

  • 遙섇듅럤겗烏③씊域쀦탡

    96%

  • 깙궑꺍깋꺁궢꺖깛궧

    93%

燁곥걼걾겗閭닷뤁