π2-CYGNI

Modular Sub-Micron Patterning and Photolithographic System
π2-Cygni는 반도체 FAB없이 PEDOT, PMMA, PET와 같은 다양한 유기 물질에
포토레지스트가 없는 포토리소그래피를 최소 500nm까지 지원하여 고객은 R&D 및 프로젝트에만 집중할 수 있습니다.
FEATURES

● Next-Generation VUV Light Source: 172 nm
● Best-In-Class Output Intensity
● Exceptional Beam Uniformity: 3% Across Available Aperture
● Long Lamp Life: Up to 30,000 Exposures
● Near-Instantaneous Lamp Turn-On
● Compact, Rugged, and Portable
● Standardized Accessory Mounting Sytem: One Light Source, Many Applications
● Intuitive Design Reduces Training Requirements for All Users
● Environmentally Friendly Operation and Processing

Applications

● High-Resolution Photolithography
● Photoablation
● Photolytic/Photocatalytic Processes
● Surface Energy Modification
● Ozone Generation
● Low-Damage Atomic-Level Surface Cleaning
● Enhanced Thin Film Adhesion