α-Line

Universal Manual Alignment System
α-Line 은 마이크로 일렉트로닉스및 포토 레지스트를 넘어 정렬기의 실용성을 확장합니다.
FEATURES

● High resolution alignment and exposure system in a rugged and small-footprint package
● Back-to-basics design focused on accuracy, stability, and simplicity of operation
● Extended range of photochemistries and substrate materials breaks through limitations of traditional photolithography
● Consistent, high quality results for all operator skill-levels
● Photolithography anywhere. Low power and available options for stand-alone operation
● Set-up and forget. Robust mechanical and optical components provide for extended maintenance and calibration intervals
● Relevant technical fields: semiconductors, microfluidics, bio-assays, optics, and more

Applications

● Conventional photolithography
● Direct polymer imaging/photoablation
Micro- and Nanofluidics
Optical Components
● Patterned surface energy modification
● Selective surface functionalization