TECH BLOG

2020 븳援諛붿씠삤移⑺븰쉶 異붽퀎븰닠쉶 李멸(2020.11.25~11.27)-172NM

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2020 룷넗땳뒪썾뒪듃 2020(PHOTONICS WEST 2020)李멸(2020.2.1~2.6)-172NM

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2021, 젣23쉶 븳援 MEMS 븰닠쉶

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2019 븳援諛붿씠삤移⑺븰쉶 異붽퀎븰닠쉶 李멸(2019.11.13~11.15)-172NM

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Application.4_PMMA Photolithography

Application PMMA Photolithography Bulk PMMA (extruded acrylic sheet) 15 second exposure, no development Shifting The Light Processing Paradigm with VUV Radiation Cygnus Photonics technology eliminates the need... Read more

Application.2_High-Resolution Low-Cost Photolithography

Application 2. High-Resolution Low-Cost Photolithography Sub-micron contact resolution achievable with basic contact exposure Positive, negative, and dry development techniques from single resist chemistry High photon energy... Read more

Application.1_ORGANIC POLYMER PHOTOLITHOGRAPHY

Application 1. ORGANIC POLYMER PHOTOLITHOGRAPHY Optical micrograph of acrylic sheet exposed through a photomask for 90 s. Numbers on top represent feature size in 關m The -Cygni eliminates the... Read more

2019 쟾 븯씠뀒겕럹뼱 쟾떆쉶 李멸(2019.10.21~10.22)

                쟾븯씠뀒겕럹뼱 쟾떆쉶 븞궡(2019뀈 10썡 21-22씪) (二)諛곌뿉꽌 10썡 21씪 – 22씪뿉 쟾뿉꽌 뿴由щ뒗 븯씠뀒겕럹뼱뿉 李멸 빀땲떎. 쟾떆쉶 湲곌컙룞븞 2-CYGNI FSE-172 옣鍮꾨... Read more

172NM 솃럹씠吏 삤뵂!

172nm 솃럹씠吏瑜 삤뵂븯뒿땲떎. 172nm(VUV Nano Mechatronics) 瑜 넻빐꽌 吏湲덇퉴吏 븷 닔 뾾뿀뜕 PR-Free Lithography 씪뒗 媛옣 쁺떊쟻씤 湲곗닠쓣 넻븯뿬 R&D 뼇궛뿉 떎吏덉쟻씤 룄쓣 뱶由 닔 엳룄濡 븯寃좎뒿땲떎. 솃럹씠吏 媛곸쥌... Read more