Application.2_High-Resolution Low-Cost Photolithography

  • AUTHOR: 172NM
  • 2019뀈 11쐢 9씪
Application.2_High-Resolution Low-Cost Photolithography

Application
2. High-Resolution Low-Cost Photolithography

Sub-micron contact resolution achievable with basic contact exposure
Positive, negative, and dry development techniques from single resist chemistry
High photon energy combined with high average lamp power makes < 5 sec exposure times possible
2.5% uniformity of output intensity over lamp emission area at 10mm lamp-to-sample separation

HIGH POWER PLANAR VACUUM-ULTRAVIOLET UNLEASHES NEW POSSIBILITIES IN PHOTO-PROCESSING
Never before has there been a lamp which combines high power, exceptional uniformity, and versatility in an efficient and compact modular form fact – at 172 nm! The revolution begins with the introduction of the 2-CYGNI series of vacuum-ultraviolet light processing systems

Unmatched Single-Exposure Resolution
Shorter wavelength = higher resolution. The 2-CYGNI offers the potential for a 50% improvement in resolution over I-line lithography.

LOW-COST MICROPATTERNING TECHNOLOGY

Ability to pattern most organic materials
Thin film or bulk material patterning
Dry lithographic process
Polymer Optics Fabrication
줞icropatterning with a Functionality (Hydrophilic and 뱎hobicity, Photochemical processes)